Promotional price valid on web orders only. Your contract pricing may differ. Interested in signing up for a dedicated account number?
Learn More
Learn More
Electron Microscopy Sciences Graphene on Thermal SiO2 on Ultra-Flat Silicon, 6-8 layers, 2.1-2.8 nm thick, 78.5-83.2% Transparency
Supplier: Electron Microscopy Sciences 6GUFSIO225
CVD graphene on ultra-flat thermal SiO2. The high quality graphene is produced by chemical vapor deposition, a process by which gaseous reactants are deposited onto a substrate. The Ultra-flat Thermal SiO2 Substrate consists of a 200 nm thermally grown SiO2 film on an ultra-flat silicon wafer with a normal thickness of 675 um. The size is 5 mm x 5 mm. Graphene coverage of the TEM grid is better than 75 percent. Available in four thicknesses of CVD graphene, 1, 2, 3-5, and 6-8.
Layers: 6-8 layers
Thickness: 2.1-2.8 nm
Transparency: 78.5-83.2%
Product Content Correction
The Fisher Scientific Encompass Program offers items which are not part of our distribution portfolio. These products typically do not have pictures or detailed descriptions. However, we are committed to improving your shopping experience. Please use the form below to provide feedback related to the content on this product.
Product Title
Spot an opportunity for improvement?Share a Content Correction