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Sputtering Targets

Sputtering targets are specialized materials employed for thin-film deposition in various industries, including electronics, energy, and textiles. These targets can be composed of different elemental or alloy compositions, such as pure metals or ceramics, and are bombarded by ions, causing atoms or molecules to be ejected from their surface. These particles then deposit on a substrate to create a thin, uniform film. Different types of sputtering targets exist, including planar or rotary targets and a range of materials, such as gold, silver, titanium, and tungsten. Their selection depends on different factors like the application requirements, material properties, and compatibility with the sputtering system.
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1

Copper sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)

CAS: 7440-50-8 Molecular Formula: Cu Molecular Weight (g/mol): 63.55 MDL Number: MFCD00010965 InChI Key: RYGMFSIKBFXOCR-UHFFFAOYSA-N Synonym: cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer PubChem CID: 23978 ChEBI: CHEBI:30052 IUPAC Name: copper SMILES: [Cu]

PubChem CID 23978
CAS 7440-50-8
Molecular Weight (g/mol) 63.55
ChEBI CHEBI:30052
MDL Number MFCD00010965
SMILES [Cu]
Synonym cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer
IUPAC Name copper
InChI Key RYGMFSIKBFXOCR-UHFFFAOYSA-N
Molecular Formula Cu
2

Copper sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)

CAS: 7440-50-8 Molecular Formula: Cu Molecular Weight (g/mol): 63.55 MDL Number: MFCD00010965 InChI Key: RYGMFSIKBFXOCR-UHFFFAOYSA-N Synonym: cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer PubChem CID: 23978 ChEBI: CHEBI:30052 IUPAC Name: copper SMILES: [Cu]

PubChem CID 23978
CAS 7440-50-8
Molecular Weight (g/mol) 63.55
ChEBI CHEBI:30052
MDL Number MFCD00010965
SMILES [Cu]
Synonym cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer
IUPAC Name copper
InChI Key RYGMFSIKBFXOCR-UHFFFAOYSA-N
Molecular Formula Cu
3

Copper sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)

CAS: 7440-50-8 Molecular Formula: Cu Molecular Weight (g/mol): 63.55 MDL Number: MFCD00010965 InChI Key: RYGMFSIKBFXOCR-UHFFFAOYSA-N Synonym: cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer PubChem CID: 23978 ChEBI: CHEBI:30052 IUPAC Name: copper SMILES: [Cu]

PubChem CID 23978
CAS 7440-50-8
Molecular Weight (g/mol) 63.55
ChEBI CHEBI:30052
MDL Number MFCD00010965
SMILES [Cu]
Synonym cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer
IUPAC Name copper
InChI Key RYGMFSIKBFXOCR-UHFFFAOYSA-N
Molecular Formula Cu
4

Copper sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis)

CAS: 7440-50-8 Molecular Formula: Cu Molecular Weight (g/mol): 63.55 MDL Number: MFCD00010965 InChI Key: RYGMFSIKBFXOCR-UHFFFAOYSA-N Synonym: cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer PubChem CID: 23978 ChEBI: CHEBI:30052 IUPAC Name: copper SMILES: [Cu]

PubChem CID 23978
CAS 7440-50-8
Molecular Weight (g/mol) 63.55
ChEBI CHEBI:30052
MDL Number MFCD00010965
SMILES [Cu]
Synonym cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer
IUPAC Name copper
InChI Key RYGMFSIKBFXOCR-UHFFFAOYSA-N
Molecular Formula Cu
5

Copper sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)

CAS: 7440-50-8 Molecular Formula: Cu Molecular Weight (g/mol): 63.55 MDL Number: MFCD00010965 InChI Key: RYGMFSIKBFXOCR-UHFFFAOYSA-N Synonym: cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer PubChem CID: 23978 ChEBI: CHEBI:30052 IUPAC Name: copper SMILES: [Cu]

PubChem CID 23978
CAS 7440-50-8
Molecular Weight (g/mol) 63.55
ChEBI CHEBI:30052
MDL Number MFCD00010965
SMILES [Cu]
Synonym cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer
IUPAC Name copper
InChI Key RYGMFSIKBFXOCR-UHFFFAOYSA-N
Molecular Formula Cu
6

Copper sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)

CAS: 7440-50-8 Molecular Formula: Cu Molecular Weight (g/mol): 63.55 MDL Number: MFCD00010965 InChI Key: RYGMFSIKBFXOCR-UHFFFAOYSA-N Synonym: cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer PubChem CID: 23978 ChEBI: CHEBI:30052 IUPAC Name: copper SMILES: [Cu]

PubChem CID 23978
CAS 7440-50-8
Molecular Weight (g/mol) 63.55
ChEBI CHEBI:30052
MDL Number MFCD00010965
SMILES [Cu]
Synonym cuprum,cobre,cuivre,blister,cathode,bronze,powder,anode,precipitates,kupfer
IUPAC Name copper
InChI Key RYGMFSIKBFXOCR-UHFFFAOYSA-N
Molecular Formula Cu
7

Electron Microscopy Sciences Sputtering Target Copper, 63.5 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 63.5 mm

ENCOMPASS_PREFERRED
8

Electron Microscopy Sciences Sputtering Target Copper, 50 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 50 mm

ENCOMPASS_PREFERRED
9

Electron Microscopy Sciences Sputtering Target Copper, 39 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 39 mm

ENCOMPASS_PREFERRED
10

Electron Microscopy Sciences Sputtering Target Copper, 57 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 57 mm

ENCOMPASS_PREFERRED
11

Electron Microscopy Sciences Sputtering Target Copper, 42 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 42 mm

ENCOMPASS_PREFERRED
12

Electron Microscopy Sciences Sputtering Target Copper, 60 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 60 mm

ENCOMPASS_PREFERRED
13

Electron Microscopy Sciences Sputtering Target Copper, 32 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 32 mm

ENCOMPASS_PREFERRED
14

Electron Microscopy Sciences Sputtering Target Copper, 20 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 20 mm

ENCOMPASS_PREFERRED
15

Electron Microscopy Sciences Sputtering Target Copper, 50.8 mm
SDP

EMS precious metal sputtering targets are made from high purity metals. The targets are for use on most sputtering units and includes systems manufacturers Emitech, Emscope, Bio-Rad, Polaron, Edwards, Balzers, Plasma Sciences, Technics Hummers, Denton, Cressington, and others. Our targets come in a standard thickness of 0.1 mm (100um). Targets are available mounted or unmounted. For mounting please always state the make and the model of the sputtering unit so we can tend to it for you.
EMS strives to maintain accurate pricing. However, due to fluctuations in precious metal prices, pricing on products containing precious metals is not guaranteed. We will contact you if there is a discrepancy.
Diameter: 50.8 mm

ENCOMPASS_PREFERRED