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Aluminum etchant

Catalog No. AA44581LV
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Quantity:
1 qt.
1 gal.

Description

Standard Aluminum Etchant For Use On Silicon Devices and Other Microelectronic Applications

Standard aluminum etchant for use on silicon devices and other microelectronic applications

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

TRUSTED_SUSTAINABILITY

Specifications

Chemical Name or Material Aluminum etchant
Quantity 1 gal.
Form Liquid
MDL Number MFCD08064399

Frequently Asked Questions (FAQs)

What is the solubility of Aluminum etchant?

Aluminum etchant is miscible with water.
What is the flash point of Aluminum etchant?

Aluminum etchant is non-inflammable.
What is the specific gravity (25 degrees C) of Aluminum etchant?

The specific gravity (25 degrees C) of Aluminum etchant is 1.45.
What is the freezing point of Aluminum etchant?

The freezing point of Aluminum etchant is <0 degrees C.
What is the boiling point of Aluminum etchant?

The boiling point of Aluminum etchant is >100 degrees C.
What is the pH of Aluminum etchant?

The pH of Aluminum etchant is 1.0.
How do I reduce undercutting of an etchant?

Undercutting of the etchant can be reduced by increasing the rate of stirring or agitation.
Do I need to dilute an etchant?

No, it is a ready-to-use solution. Dilution will only be necessary if you want to reduce the etch rate.
How do I reduce the etch rate of an etchant?

The etch rate of the etchant can be reduced by adding 1 part deionized water to 2 parts etchant. This will reduce the etch rate approximately 50%.
How do I increase the etch rate of an etchant?

The etch rate of the etchant will be increased by increasing the rate of stirring or agitation.
What is the etch rate of Aluminum etchant?

Aluminum etchant has the following etch rate:

  • 25 degrees C, 30 Å/sec
  • 40 degrees C, 80 Å/sec


Note: Etch rate may vary slightly based on purity of aluminum.

RUO – Research Use Only

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