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Description
- Laser-induced polymerization of gaseous ethynyltrimethylsilane was used for efficient chemical vapour deposition of polycarbosilane films. ethynyltrimethylsilane acts as substrate for nickel-catalyzed cross-coupling with benzonitriles.ethynyltrimethylsilane was used in:
- Microwave-assisted, one-pot, three-step sonogashira cross-coupling-desilylation-cycloaddition reaction for the preparation of 1,4-disubstituted 1,2,3-triazoles
- Synthesis of poly(ethynyltrimethylsilane) containing pd (ii) coordination sites
- Pyrazole synthesis via 1,3-dipolar cycloaddition of diazo compounds to acetylenes
Specifications
Specifications
| CAS | 1066-54-2 |
| Density | 0.709 g/cm3 (literature) |
| Boiling Point | 53°C (lit.) |
| Molecular Formula | C5H10Si |
| Refractive Index | n20/D 1.388 (literature) |
| Linear Formula | (CH3)3 SiC///CH |
| MDL Number | MFCD00008569 |
| Quantity | 5 g |
| Synonym | Trimethylsilylacetylene |
| Molecular Weight (g/mol) | 98.22 |
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