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Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, (8) 100 µm, (1) 100x350 µm, 20 nm
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Catalog No. 501929456
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Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.

Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Dimensions: (8) 100 µm, (1) 100x350 µm
Thickness: 20 nm

Catalog No. 50-192-9456 Supplier Electron Microscopy Sciences Supplier No. 7604248
May include imposed supplier surcharges.
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Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.

Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Dimensions: (8) 100 µm, (1) 100x350 µm
Thickness: 20 nm

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