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Nickel etchant for electrodeposited nickel films, Thermo Scientific Chemicals
Description
High purity etchant for electrodeposited nickel films
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Specifications
Specifications
Chemical Name or Material | Nickel etchant for electrodeposited nickel films |
Quantity | 1 qt. |
Form | Liquid |
MDL Number | MFCD09039236 |
UN Number | UN1760 |
Frequently Asked Questions (FAQs)
Nickel etchant for electrodeposited nickel films has an etch rate of 50 Å/second at 40 degrees C.
Undercutting of the etchant can be reduced by increasing the rate of stirring or agitation.
No, it is a ready-to-use solution. Dilution will only be necessary if you want to reduce the etch rate.
The etch rate of the etchant can be reduced by adding 1 part deionized water to 2 parts etchant. This will reduce the etch rate approximately 50%.
The etch rate of the etchant will be increased by increasing the rate of stirring or agitation.
RUO – Research Use Only
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