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Tetramethylammonium hydroxide, 1.0 M aq. soln., ACS, Thermo Scientific Chemicals
Description
Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Specifications
Specifications
Color | Colorless to Yellow |
Linear Formula | (CH3)4NOH |
Quantity | 250 mL |
UN Number | UN1835 |
Beilstein | 3558708 |
Sensitivity | Air Sensitive |
Merck Index | 14,9224 |
Solubility Information | Soluble in water. |
Formula Weight | 91.15 |
Grade | ACS |
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Safety and Handling
Hazard Category | H302-H311-H314-H370-H372 |
Hazard Statement | GHS H Statement H301-H311-H314-H371-H373 Toxic if swallowed. Toxic in contact with skin. Causes severe skin burns and eye damage. May cause damage to organs. May cause damage to organs through prolonged or repeated exposure. |
Precautionary Statement | P260-P264b-P270-P271-P280-P303+P361+P353-P304+P340-P305+P351+P338-P310-P330-P331-P363-P501c |
DOTInformation | Hazard Class: 8; Packaging Group: II |
EINECSNumber | 200-882-9 |
RTECSNumber | PA0875000 |
TSCA | Yes |
Recommended Storage | Ambient temperatures; Store under Nitrogen |
RUO – Research Use Only
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