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Hydrofluoric Acid 49% LM Prime, Transene
Description
In the semiconductor field, it is mainly used for
- Wafer surface cleaning
- Cleaning and etching during chip processing
- Other processes
- In the field of new displays, it is mainly used for glass substrate cleaning, silicon nitride, silicon dioxide etching, etc
- In the field of photovoltaic solar cells, it is mainly used for surface cleaning, etching edge removal, cleaning and velvet making of silicon wafers.
Specifications
Specifications
| Packaging | HDPE |
| Quantity | 1 gal. |
| Percent Purity | 49% |
| Grade | Electronic |
| Chemical Name or Material | Hydrofluoric Acid |
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