Electron Microscopy Grids, Mesh, and Films
Electron Microscopy Sciences AFM Substrate Ultra-Flat Silicon Wafer 4", 100 mm diameter, <100> Orientation
These ultra-flat wafers can be used for substrate studies or as substrate for AFM and SEM samples by cleaving the wafer.
Diameter: 100 mm
Orientation: <100>
Thickness: 525 µm±20 µm
Roughness: Typically 2-3Å
Resistivity: 10-20 Ohm-cm
Simpore Inc 20 nm thick Non-porous Silicon Nitride500×500 µm single window2.9 mm diameter + 0.1 mm thick chip framePack of 10
20 nm thick Non-porous Silicon Nitride500×500 µm single window2.9 mm diameter + 0.1 mm thick chip framePack of 10
Electron Microscopy Sciences AFM Substrate Type P Silicon Wafer 6", 150 mm diameter, <100> Orientation
These silicon wafers can be used for substrate studies or as substrate for AFM and SEM samples by cleaving the wafer. The wafers are polished on one side.
Diameter: 150 mm
Orientation: <100>
Thickness: 600-690 µm
Roughness: 2nm
Resistance: 1-30 ohms
Electron Microscopy Sciences EMS Dial A Grid-N-Block Storage With Unique Number
24 slots labeled with letters from A-X where the grids can be stored and rotated for easy access as well as 3 additional cavities for block storage.
Sigma Organic Chemistry Graphene oxide | 50ML
Graphene oxide, 50ML
About This Item:
Linear Formula: CxOyHz
UNSPSC Code: 12352103
Storage: room temp
Sigma Organic Chemistry Graphene ink in water | 10ML
Graphene ink in water, 10ML
About This Item:
UNSPSC Code: 12352103
Storage: room temp
Electron Microscopy Sciences EMS 300 mesh Square Grid, Copper-Rhodium
Grids are 3.05 mm diameter.
Grid: Copper-Rhodium
Thickness: Up to 19 µm +/- 5 µm
Pitch: 83 µm
Hole: 58 µm
Bar: 25 µm
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R1.2/1.3, Cu 400 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 400
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, (9) 100 µm, 50nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. Use: everyday imaging and demanding conditions.
Dimensions: (9) 100 µm
Thickness: 50nm
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, (2) 50x1500 µm, 5 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. Use: high resolution imaging.
Dimensions: (2) 50x1500 µm
Thickness: 5 nm
Electron Microscopy Sciences Graphene Oxide Support film on Lacey Carbon, Copper 300 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 300
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R1.2/1.3, Gold, 400 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Gold
Mesh: 400
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, 500 µm, 50 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. Recommended use: Suspensions and cryo-EM suspension.
Dimensions: 500 µm
Thickness: 50 nm
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, 500 µm, 20 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. Recommended use: Suspensions and cryo-EM suspension.
Dimensions: 500 µm
Thickness: 20 nm
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/4, Cu 200 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 200