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EMBRA electroformed grids combine a high open area with a rigid construction which allows for relatively easy handling. 3.05 mm diameter, 50 micron thick for oval hole grids. I.D.: 2 x 1 mm Material: Molybdnum
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Stage graticules are used for the routine calibration of eyepiece patterns, particularly when alternating between objectives on one microscope or when using the same graticule in different microscopes. Their robust construction makes them ideal for student use and for instructional purposes. The scale or grid is centered on a glass disc mounted in a black anodized aluminum slide 75 mm x 24 mm x 2 mm thick. Scale: Horizontal Length: 20 mm Divisions: 200 each 0.01 mm
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This Test Specimen is made of a 5 mmx5 mm square of single crystal silicon. It is photo-etched and the squares repeat every 10 um. The dividing lines are 1.9 um wide.
A broader etching line is written every 500 um, which is useful in light microscopy. This is an excellent test specimen for comparing magnification and assessing any distortion in the image field. It is ideally useful in the context of automated counting systems to check for unsuspected distortions. Where critical measurements must be made the sample can be mounted directly onto the calibration specimen so that an internal calibration is obtained on the micro-graph.
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Standard pattern discs for metallurgical stereometric analysis of grain size in polished metal sections. ASTM 24 point circular grid, glass sandwich. Size: 19mm Method: ASTM 24 Surface: Glass sandwich
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Designed to aid in the identification and localization of SEM specimens when placed on standard SEM stubs. Larger cells identified 1-57 & subdivided into 4. 228 identifiable cells. Material: Gold Diameter: 10 mm Thickness: ~50 µm
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Designed to aid in the identification and localization of SEM specimens when placed on standard SEM stubs. Four quadrant markers tapered towards center. 100 radial sectors. Material: Copper Diameter: 10 mm Thickness: ~50 µm
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For optimum viewing, fluorescent screens should be recoated regularly. Viewing screens are easily damaged by the electron beam, especially at high accelerating voltages where knock-on damage can be severe. A proprietary process where 1 to 2 micron particles of phosphor are deposited on the screen and produce the highest possible resolution.
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