Polishing and Abrasive Compounds
Aluminum oxide, polishing compound
CAS: 1344-28-1 Molecular Formula: Al2O3 Molecular Weight (g/mol): 101.96 MDL Number: MFCD00003424 InChI Key: PNEYBMLMFCGWSK-UHFFFAOYSA-N PubChem CID: 9989226 IUPAC Name: dialuminium(3+) trioxidandiide SMILES: [O--].[O--].[O--].[Al+3].[Al+3]
Pumice Stone, Honeywell Fluka™
CAS: 1332-09-8 Molecular Formula: Al2O5Si Molecular Weight (g/mol): 162.04 MDL Number: MFCD00011232 MFCD00217788 MFCD00148266 MFCD00603035 MFCD02100519 MFCD06202255 MFCD07370732 MFCD07370733 InChI Key: HNPSIPDUKPIQMN-UHFFFAOYSA-N PubChem CID: 76973482 IUPAC Name: oxo[(oxoalumanyl)oxy]alumane; silanedione SMILES: O=[Si]=O.O=[Al]O[Al]=O
KSE Scientific Abrasive Sheets, Krackeler Scientific
Sheets, Abrasive, Krackeler
Cerium(IV) oxide, polishing compound, 57g (2oz)
CAS: 1306-38-3 Molecular Formula: CeO2 Molecular Weight (g/mol): 172.114 MDL Number: MFCD00010933 InChI Key: CETPSERCERDGAM-UHFFFAOYSA-N PubChem CID: 73963 ChEBI: CHEBI:79089 IUPAC Name: dioxocerium SMILES: O=[Ce]=O
Pumice stone, granular (approx. 1-5 mm)
CAS: 1332-09-8 Molecular Formula: Al2O5Si Molecular Weight (g/mol): 162.04 MDL Number: MFCD00011232 MFCD00217788 MFCD00148266 MFCD00603035 MFCD02100519 MFCD06202255 MFCD07370732 MFCD07370733 InChI Key: HNPSIPDUKPIQMN-UHFFFAOYSA-N PubChem CID: 76973482 IUPAC Name: oxo[(oxoalumanyl)oxy]alumane; silanedione SMILES: O=[Si]=O.O=[Al]O[Al]=O
Thermo Scientific Rust Inhibitor
Used with any Symphony Water Jacket Incubator. Rust Inhibitor should be used anytime the water jacket is emptied or every two years.
EZKEM Polishing Compound CN working Electrode
EZkem’s Electrode Polishing Compound is the perfect grade of electrode polishing compound for Silver or Gold Electrodes. Use the electrode polishing compound as required for the normal, ongoing maintenance of the amperometric flowcell when using the Gas Diffusion Cyanide Analysis technique on OI Analytical or various other Autoanalyzer Instrument types.
Electron Microscopy Sciences Glennel Diamond Paste UB Water/Oil Soluble, Monocrystalline 9 µm 5 GR
Glennel diamond products are specially formulated to help you prepare surfaces that are usually difficult to polish and require precision finish. To satisfy today's demand the diamond compounds must be complex with near perfect tolerances as is ours. UB formulation is excellent for most applications. Monocrystalline diamonds provide a cost effective means for good stock removal and finish.
Type: Monocrystalline
Size: 9 µm
Electron Microscopy Sciences Glennel Diamond Paste UBS Water/Oil Soluble, Polycrystalline 30 µm 5 GR
Glennel diamond products are specially formulated to help you prepare surfaces that are usually difficult to polish and require precision finish. To satisfy today's demand the diamond compounds must be complex with near perfect tolerances as is ours. UB formulation is excellent for most applications and used for polishing laboratory specimens. Polycrystalline diamonds are ideal for microscopy, materialography, and where surface finish is extremely critical.
Type: Polycrystalline
Size: 30 µm
Electron Microscopy Sciences Silicone Carbide Abrasive Film Disc, 30 µm, Plain Back
Silicon carbide abrasive film discs are ready to use for polishing and grinding. Discs are 8" in diameter.
Particles: 30 µm
Backing: Plain
LECO Corporation Aluminum Oxide Powder, Alpha C Alumina | 1.0 micron | 1lb (0.45kg )
Aluminum Oxide Powder, Alpha C Alumina | 1.0 micron | 1lb (0.45kg )
