Polishing and Abrasive Compounds
Polishing and Abrasive Compounds
Cerium(IV) oxide, polishing compound, 57g (2oz), Thermo Scientific Chemicals
CAS: 1306-38-3 Molecular Formula: CeO2 Molecular Weight (g/mol): 172.114 MDL Number: MFCD00010933 InChI Key: CETPSERCERDGAM-UHFFFAOYSA-N PubChem CID: 73963 ChEBI: CHEBI:79089 IUPAC Name: dioxocerium SMILES: O=[Ce]=O
Aluminum oxide, polishing compound, Thermo Scientific Chemicals
CAS: 1344-28-1 Molecular Formula: Al2O3 Molecular Weight (g/mol): 101.96 MDL Number: MFCD00003424 InChI Key: PNEYBMLMFCGWSK-UHFFFAOYSA-N PubChem CID: 9989226 IUPAC Name: dialuminium(3+) trioxidandiide SMILES: [O--].[O--].[O--].[Al+3].[Al+3]
Pumice Stone, Granular, For Elementary Analysis, MilliporeSigma™
CAS: 1332-09-8 Molecular Formula: C28H37FO7 Molecular Weight (g/mol): 509.626 InChI Key: CIWBQSYVNNPZIQ-YBDIZOPJSA-N PubChem CID: 76973482 IUPAC Name: [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate SMILES: CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC
Pumice Stone, Honeywell Fluka™
CAS: 1332-09-8 Molecular Formula: C28H37FO7 Molecular Weight (g/mol): 509.626 MDL Number: MFCD00148147 InChI Key: CIWBQSYVNNPZIQ-YBDIZOPJSA-N PubChem CID: 76973482 IUPAC Name: [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate SMILES: CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC
Abrasive Sheets, Krackeler Scientific
Sheets, Abrasive, Krackeler
Pumice stone, granular (approx. 1-5mm), Thermo Scientific Chemicals
CAS: 1332-09-8 Molecular Formula: C28H37FO7 Molecular Weight (g/mol): 509.626 MDL Number: MFCD00148147 InChI Key: CIWBQSYVNNPZIQ-YBDIZOPJSA-N PubChem CID: 76973482 IUPAC Name: [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate SMILES: CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC
Buehler CARBIMET PSA, 320, 8IN
This item has a minimum qty of 2 per supplier requirements.
Carbimet PSA, 320, 8in
Electron Microscopy Sciences Aluminum Oxide Abrasive Discs 8", PSA backing
Alumina is widely used in sample grinding and polishing. Our Aluminum Oxide Abrasive film with a PSA back or a plain back are ready to use in all sample polishing applications.
Backing: PSA
Electron Microscopy Sciences Silicone Carbide Powder, 10 µm particles 1 LB
Dark gray 98% SiC. Hardness, Moh's scale 9.0; Knoop Scale 2500. Crystallography: hexagonal–alpha and beta phase.
Size: 10 µm
Electron Microscopy Sciences Silicone Carbide Powder, 35 µm particles 1 LB
Dark gray 98% SiC. Hardness, Moh's scale 9.0; Knoop Scale 2500. Crystallography: hexagonal–alpha and beta phase.
Size: 35 µm
Electron Microscopy Sciences Diamond Polishing Powder, 9 µm particles 2 GR
Our diamond powder is made from synthetic diamonds.Our diamond powder is made from synthetic diamonds.
Size: 9 µm