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Polishing and Abrasive Compounds

Abrasives and polishing compounds are used to polish or clean a hard surface by grinding or rubbing. Products are available in powders, sheets, solutions, kits, etc.
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1 – 15 of 381 results
1

Marble's Reagent, Ricca Chemical
SDP

CAS 7758-99-8
Chemical Name or Material Marble's Reagent
2

Pumice stone, granular (approx. 1-5 mm)

CAS: 1332-09-8 Molecular Formula: C28H37FO7 Molecular Weight (g/mol): 509.626 MDL Number: MFCD00148147 InChI Key: CIWBQSYVNNPZIQ-YBDIZOPJSA-N PubChem CID: 76973482 IUPAC Name: [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate SMILES: CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC

PubChem CID 76973482
CAS 1332-09-8
Molecular Weight (g/mol) 509.626
MDL Number MFCD00148147
SMILES CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC
IUPAC Name [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate
InChI Key CIWBQSYVNNPZIQ-YBDIZOPJSA-N
Molecular Formula C28H37FO7
3

Aluminum oxide, polishing compound

CAS: 1344-28-1 Molecular Formula: Al2O3 Molecular Weight (g/mol): 101.96 MDL Number: MFCD00003424 InChI Key: PNEYBMLMFCGWSK-UHFFFAOYSA-N PubChem CID: 9989226 IUPAC Name: dialuminium(3+) trioxidandiide SMILES: [O--].[O--].[O--].[Al+3].[Al+3]

PubChem CID 9989226
CAS 1344-28-1
Molecular Weight (g/mol) 101.96
MDL Number MFCD00003424
SMILES [O--].[O--].[O--].[Al+3].[Al+3]
IUPAC Name dialuminium(3+) trioxidandiide
InChI Key PNEYBMLMFCGWSK-UHFFFAOYSA-N
Molecular Formula Al2O3
4

Cerium(IV) oxide, polishing compound, 57g (2oz)

CAS: 1306-38-3 Molecular Formula: CeO2 Molecular Weight (g/mol): 172.114 MDL Number: MFCD00010933 InChI Key: CETPSERCERDGAM-UHFFFAOYSA-N PubChem CID: 73963 ChEBI: CHEBI:79089 IUPAC Name: dioxocerium SMILES: O=[Ce]=O

PubChem CID 73963
CAS 1306-38-3
Molecular Weight (g/mol) 172.114
ChEBI CHEBI:79089
MDL Number MFCD00010933
SMILES O=[Ce]=O
IUPAC Name dioxocerium
InChI Key CETPSERCERDGAM-UHFFFAOYSA-N
Molecular Formula CeO2
6

Abrasive Sheets, Krackeler Scientific
SDP

Sheets, Abrasive, Krackeler

Chemical Name or Material Abrasive sheet
7

Pumice Stone, Honeywell Fluka™

CAS: 1332-09-8 Molecular Formula: C28H37FO7 Molecular Weight (g/mol): 509.626 MDL Number: MFCD00148147 InChI Key: CIWBQSYVNNPZIQ-YBDIZOPJSA-N PubChem CID: 76973482 IUPAC Name: [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate SMILES: CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC

PubChem CID 76973482
CAS 1332-09-8
Molecular Weight (g/mol) 509.626
MDL Number MFCD00148147
SMILES CCC(=O)OCC(=O)C1(C(CC2C1(CC(C3(C2CCC4=CC(=O)C=CC43C)F)O)C)C)OC(=O)CC
IUPAC Name [2-[(8S,9R,10S,11S,13S,16S,17R)-9-fluoro-11-hydroxy-10,13,16-trimethyl-3-oxo-17-propanoyloxy-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] 2,2,3,3,3-pentadeuteriopropanoate
InChI Key CIWBQSYVNNPZIQ-YBDIZOPJSA-N
Molecular Formula C28H37FO7
8

EZKEM Polishing Compound CN working Electrode
SDP

EZkem’s Electrode Polishing Compound is the perfect grade of electrode polishing compound for Silver or Gold Electrodes. Use the electrode polishing compound as required for the normal, ongoing maintenance of the amperometric flowcell when using the Gas Diffusion Cyanide Analysis technique on OI Analytical or various other Autoanalyzer Instrument types.

ENCOMPASS_PREFERRED
9

Electron Microscopy Sciences Diamond Disc 10" 400 grit, PSA Steel Magnetic Back
SDP

Flexible Diamond Discs will reduce the number of steps in the grinding/polishing process along with a decrease in preparation time. Our Flexible Diamond Discs replace traditional SiC discs for most applications and give a superior finish and perfectly flat specimens. The patterned design minimizes build up of abraded material.
Particles: 400 grit
Backing: PSA Steel Plate Magnetic

ENCOMPASS_PREFERRED
10

Electron Microscopy Sciences Diamond Lapping Film 8", Plain Backing, 0.5 µm Particles
SDP

A selective diamond particle resin bonded to a uniform 3-mil polyester film backing. Excellent for polishing samples with differing hardness. Ideal for the preparation of cross sections for SEM/TEM analysis.
Backing: Plain
Particles: 0.5 µm

ENCOMPASS_PREFERRED
11

Electron Microscopy Sciences Diamond Lapping Film 8", PSA Backing, 6 µm Particles
SDP

A selective diamond particle resin bonded to a uniform 3-mil polyester film backing. Excellent for polishing samples with differing hardness. Ideal for the preparation of cross sections for SEM/TEM analysis.
Backing: PSA
Particles: 6 µm

ENCOMPASS_PREFERRED
12

Electron Microscopy Sciences Wet or Dry Silicone Carbide Disc 8", 600 Grit, PSA backing
SDP

Pregrinding Wet/Dry Abrasive Papers (Discs) with premium Resin Bonding System for longer wear. Special adhesive eliminates need to transfer to plates. Uniform mineral size. Pull tabs for easy use.
Particles: 600 Grit
Backing: PSA

ENCOMPASS_PREFERRED
13

Electron Microscopy Sciences Nylon Polishing Cloth, PSA no hole, 8"
SDP

These polishing cloths are made of a durable napless nylon weave and provide an excellent finish on most materials. The cloth is 8" in diameter.
Type: no hole
Diameter: 8"

ENCOMPASS_PREFERRED
14

Electron Microscopy Sciences Diamond Disc 10" 1500 grit, PSA backing
SDP

Flexible Diamond Discs will reduce the number of steps in the grinding/polishing process along with a decrease in preparation time. Our Flexible Diamond Discs replace traditional SiC discs for most applications and give a superior finish and perfectly flat specimens. The patterned design minimizes build up of abraded material.
Particles: 1500 grit
Backing: PSA

ENCOMPASS_PREFERRED
15

Buehler MICROPOLISH II 1 MICRON 1LB

This item has a minimum qty of 4 per supplier requirements.

ENCOMPASS